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LEOI-30A Diffraction Intensity Measurement System - Enhanced Model
Category: Optical Experiment System  Publish Time: 2014-07-04 17:29 

LEOI-30A Diffraction Intensity Measurement System - Enhanced Model
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LEOI-30A Diffraction Intensity Measurement System - Enhanced Model

Description
This apparatus is designed to quantitatively investigate diffraction and interference effects of single-slit, multi-slit, and single-wire. There are three options of the photo-receiving device, i.e. a photo-cell with amplifier (option 1) for manual data acquisition, a linear CCD (option 2) for real-time data display on an oscilloscope, and a linear CCD with automatic data acquisition (option 3) for PC .
Specification

Optical Rail 

length 1.1 m

Semiconductor Laser

3.0 mW @650 nm

Element

Single-Slit

slit width: 0.07 mm, 0.10 mm, and 0.12 mm

Single-Wire

diameter: 0.10 mm and 0.12 mm

Double-Slit

slit width 0.02 mm , central spacing 0.04 mm

Double-Slit

slit width 0.07 mm , central spacing 0.14 mm

Double-Slit

slit width 0.07 mm , central spacing 0.21 mm

Double-Slit

slit width 0.07 mm , central spacing 0.28 mm

Triple-Slit

slit width 0.02 mm , central spacing 0.04 mm

Quadruple-Slit

slit width 0.02 mm , central spacing 0.04 mm

Pentuple-Slit

slit width 0.02 mm , central spacing 0.04 mm

Photocell Detector (Option 1)

With 0.1 mm reading ruler & amplifier, connected to galvanometer

CCD (Option 2)

pixel number: 2700; size: 11×11 μm; spectral range: 0.3~0.9 μm

with synchronization/signal ports, connected to an oscilloscope

CCD and Data Acquisition (Option 3)

USB connected to PC, DAC 12-bit, with application program


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