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Si-Photodiode Chip—PD 0.9×0.9
Parameter |
Symbol |
Rating |
Unit |
Operating temperature |
TC |
-40~+85 |
℃ |
Storage temperature |
TSTG |
-50~+100 |
℃ |
The Opto-electronic Characteristics(@Tc=22±3℃)
Parameters |
Sym. |
Test conditions |
Min |
Typ |
Max |
Unit |
Response Spectrum |
λ |
- |
350~1100 |
nm |
||
Active Size |
A |
- |
0.9×0.9 |
mm2 |
||
Reponsivity |
Re |
λ=0.90μm, VR=10V, φe=1μw |
0.50 |
- |
- |
A/W |
λ=0.66μm, VR=10V, φe=1μw |
0.30 |
|||||
Rise time |
tr |
λ=0.85μm, VR=10V, φe=1μw |
- |
8 |
- |
ns |
Forward Voltage |
VF |
IF=1mA |
- |
- |
0.9 |
V |
Reverse Breakdown Voltage |
VBR |
ID=10A, φe=0 |
20
|
-
|
-
|
V |
Dark Current |
ID |
VR=10V, φe=0 |
- |
|
10 |
nA |
Capacitance |
CPD |
VR=10V, φe=0, f=1MHz |
-
|
5
|
-
|
pF |
Outline Diagram & Die Dimensions
Die Size
1.1.mm×1.1mm
Die Thickess
320±50μm
Bond Pad Diameter
120μm
Photosensitive Size
0.9mm×0.9mm
P metal
Al
N metal
Au
Note: The structure of PIN PD is planar and front illuminated with P electrode on the top and N electrode on the bottom.
Notes
1.Take appropriate ESD protections to avoid damage.
2.InP chips are fragile and easily damaged, so special caution should be used when handling. Do not handle with tweezers. A vacuum tip with a flat surface is recommended.
3.Bonding force and temperature should be applied in a gradual fashion.
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